A1351LKTTN-T Allegro Microsystems Inc, A1351LKTTN-T Datasheet - Page 22

IC SENSOR HALL EFFECT 4-SIP

A1351LKTTN-T

Manufacturer Part Number
A1351LKTTN-T
Description
IC SENSOR HALL EFFECT 4-SIP
Manufacturer
Allegro Microsystems Inc
Type
Linear - Unipolar, Bipolarr
Datasheet

Specifications of A1351LKTTN-T

Sensing Range
0.055% ~ 0.095% DC/G
Voltage - Supply
4.5 V ~ 5.5 V
Current - Supply
10mA
Current - Output (max)
1mA
Output Type
Digital, Push-Pull
Features
High Precision
Operating Temperature
-40°C ~ 125°C
Package / Case
4-SIP
Lead Free Status / RoHS Status
Lead free / RoHS Compliant
Other names
620-1228-2
A1351
Figure 8. The flux density per ampere measured by the A1351 Hall device
is related to the core gap, as shown. This figure assumes that the current
sensing application is constructed using the example setup.
14
12
10
8
6
4
2
0
0.5
Flux Density per Ampere vs. Gap for a Feedthrough Sensor
1
Wire
1.5
+B
Figure 9. Side view of example current-conducting wire and split ring concentrator (left), and
magnetic profi le (right) through the midplane of the gap in the split ring concentrator. The fl ux
denisty through the center of the gap varies between the inside and the outside of the gap.
–2
Gap (mm)
mm
0
Ring concentrator
2
2
with a Push/Pull, Pulse Width Modulated Output
Magnetic flux in gap
Measurement plane
(midplane of gap)
2.5
High Precision Linear Hall Effect Sensor IC
3
3.5
The flux density measured by the A1351 SIP is related to the
size of the gap cut into the core. The larger the gap in the core,
the smaller the flux density per ampere of applied current (see
figure 8).
Figure 9 depicts the magnetic flux density through the center of
the SIP as a function of SIP to core alignment. Note that a core
with a larger cross-sectional area would reduce the attenuation
in flux density that results from any SIP misalignment. The flat
portion of the curve in figure 9 would span a larger distance in
millimeters if the cross-sectional area of the core were increased.
7.0
6.5
6.0
5.5
5.0
4.5
4.0
3.5
3.0
–2.0
Radial Displacement from Concentrator Centerline (mm)
Interior side of
Concentrator
–1.0
115 Northeast Cutoff
1.508.853.5000; www.allegromicro.com
Allegro MicroSystems, Inc.
Worcester, Massachusetts 01615-0036 U.S.A.
0
Exterior side of
Concentrator
1.0
2.0
22

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